Scientists Discover a New Way To Control Metals at the Atomic Scale

Researchers at the University of Minnesota Twin Cities have identified a new technique to modify the electronic behavior of metallic ruthenium dioxide (RuO2) by controlling atomic-level interactions at material interfaces. Published in *Nature Communications*, the study demonstrates that interfacial polarization can alter the surface work function of RuO2 by more than 1 electron volt (eV) simply by changing the film thickness to around 4 nanometers—the width of a single strand of DNA. This discovery challenges conventional assumptions about polarization, which is typically associated with insulators or ferroelectrics rather than metals. The effect arises when the metal transitions from a 'stretched' atomic arrangement—dictated by the underlying material—to a more 'relaxed' structure. This shift directly impacts how the metal conducts electricity and responds to external stimuli. Lead researcher Bharat Jalan, professor and Shell Chair in Chemical Engineering and Materials Science, emphasized that this finding opens a new pathway for controlling metallic properties through interface design. Co-author Seung Gyo Jeong noted the unexpected scale of the work function change, highlighting the significance of visualizing atomic-scale polar displacements and linking them to electronic measurements. The study suggests practical applications in developing faster, more energy-efficient electronics, advanced catalytic systems, and quantum devices. The research was conducted by Seung Gyo Jeong and colleagues, with funding from the U.S. Department of Energy and the Air Force Office of Scientific Research. The findings were published on February 9, 2026, under the title 'Strain-stabilized interfacial polarization tunes work function over 1 eV in RuO2/TiO2 heterostructures.' This breakthrough could reshape materials science by demonstrating that metallic systems can be engineered at the atomic level to achieve precise electronic tuning. The work underscores the potential of nanoscale manipulation in creating next-generation technologies with enhanced performance.